No Mask Lithography Machine
Model: MicroLab III
Manufacturer: Su Dawei Ge
Technical Specifications: Maximum Substrate Size: 5” x 5”
Maximum Writing Area: 100 x 100mm²
Substrate Thickness: 0-15 mm
Output Power: 960mw
Minimum Resolution/Structure Size: 0.5μm
Minimum Line Width Spacing: 1μm
Alignment Accuracy ( >5x5mm²) [3σ, nm] ≤500
Alignment Accuracy ( >50x50mm²) [3σ, nm] ≤1000
Writing Speed: 80mm²/min at 2μm
