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Material Growth Process
Low Pressure Chemical Vapor Deposition System LPCVD
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Product Detail

Low Pressure Chemical Vapor Deposition System LPCVD

Model: TYTAN 4600 Furnace System
Manufacturer: Tystar Corporation, USA
Main Functions: SiO2, Si3N4, polysilicon film preparation
Technical Specifications: Size: 4-6"; 50 wafers / furnace
 
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