中文 | En
中文 | En
Foundry
Foundry
Position： Home > Foundry > Equipment > Material Growth Process
Material Growth Process
Plasma-Enhanced Atomic Layer Deposition
Download PDF
Product Detail

Plasma-Enhanced Atomic Layer Deposition

Model: R200-Adv
Manufacturer: Picosun
Main Functions: Preparation of high-quality, high-precision, and highly conformal films such as Al2O3 and TiO2
Technical Specifications: 6-inch wafers, thermal deposition of Al2O3 films at 120℃, within-wafer non-uniformity ≤ 1%                       
6-inch wafers, thermal deposition of TiO2 films at 150℃, within-wafer non-uniformity ≤ 2%
 
PlutoSemi Co., Ltd.
Leading Supplier of Semiconductor Material Solutions
Phone：+86 138 2505 8605

Mobile：+86 159 8906 6199

Email：sales@plutosemi.com

Address：1815, Bldg 3, Yiyun Land Centre, No.26 Guilan North Rd, Nanhai Dist, Foshan City

Factory Address： Bldg 3, No.46, KeyuanXi Rd, Waihai Dist, Jiangmen City
Sub 1: PlutoChip Co., Ltd    -Discrete Devices and Integrated Circuits-    www.plutochip.com
Sub 2: PlutoSilica Co., Ltd   -Silicon Wafer and Glass Wafer Manufactory-
 Copyright © 2020 | PlutoSemi Co., Ltd | All Rights Reserved