Magnetron Sputtering Coating Machine
Model: MSP-3200E
Manufacturer: Beijing Chuangshi Micro-Nano Technology Co., Ltd.
Main Function: Deposition of various metal films and oxide films
Technical Specifications: Dual-chamber vacuum system: Load-lock pre-vacuum chamber and magnetron sputtering chamber
Sputtering chamber: 5.0 × 10⁻⁵ Pa, loading chamber: 6.0 × 10¹ Pa
Sputtering targets: 3 imported magnetron targets of Φ75mm, supporting DC sputtering and RF sputtering under non-volatile conditions, heating body temperature ≥ 700℃, automatic temperature control and measurement.
