8-Inch Magnetron Sputtering Coating Machine
Model: JCPY600
Manufacturer: Beijing Techno Technology Co., Ltd.
Main Function: The platform provides targets for the following materials: Al, Cr, Ni-Cr (80Ni:20Cr wt%), Ti, Cu, SiO2, W. Other materials must provide their own targets.
Technical Specifications: Sample tray for 8-inch and 4-inch. Maximum sputtering area is 8 inches. Target size is 100mm in diameter. Existing target is Cr. Gases: argon, oxygen, nitrogen. Sputtering method: DC/RF. 4 target positions. Substrate can be heated to 500℃.
