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Material Growth Process
Dual-Chamber Ultra-High Vacuum Sputtering Instrument
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Product Detail
Dual-Chamber Ultra-High Vacuum Sputtering Instrument
Model: orion8
Manufacturer: AJA, USA
Main Function: Deposition of metal films and oxide films
Technical Specifications: Dual deposition chamber system film thickness non-uniformity <2.5%
Sub 1: PlutoChip Co., Ltd -Discrete Devices and Integrated Circuits-
www.plutochip.com
Sub 2: PlutoSilica Co., Ltd -Silicon Wafer and Glass Wafer Manufactory-
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