Atomic Layer Deposition
Model: ELEGANT II-200
Manufacturer: Yuanlei Nanomaterials Co., Ltd.
Main Function: Deposition of materials such as Al2O3, TiO2, HfO2, AlN, TiN, Si3N4, Pt.
Technical Specifications: Aluminum oxide deposition, 6-inch wafer uniformity less than or equal to 1%;
Aluminum nitride deposition, 6-inch wafer uniformity less than or equal to 1%;
Titanium nitride deposition, 6-inch wafer uniformity less than or equal to 2%
