HDG Ion Beam Sputtering / Etching System
Model: Discovery HDG
Manufacturer: DENTON Vacuum, USA
Main Function: Sputtering / Etching
Technical Specifications: Sputtering source: Veeco 6cm dual-grid (molybdenum) RF ion source and power supply;
Three-way gas inlet control (20sccm, 2 at 10sccm);
Cleaning / etching source: Veeco 16cm triple-grid (molybdenum) RF ion source and water-cooled power supply;
Target holder can install 4 targets of 5 inches in diameter;
Rotating 8-inch workpiece tray, bonded with 1 oxygen-free copper piece of 6 inches in diameter, can be back-heated to 500 degrees, single-channel Speedflo reactive gas feedback control system.
Ion energy: 100 eV to 2000 eV continuously adjustable,
Film uniformity within a diameter of 6 inches better than ±1.5%, coating repeatability better than ±1.5%; etching uniformity within a diameter of 6 inches better than ±5%, etching repeatability better than ±3%
