III-V Inductively Coupled Plasma Etching Machine
Model: Plasmalab system 100 ICP180
Manufacturer: OXFORD INSTRUMENTS, UK
Main Function: Used for etching III-V compound process materials, applicable in the fabrication of LEDs, lasers, micro-nano waveguides, and other devices.
Technical Specifications: Gases: Cl2\BCl3\CH4\H2\CF4\SF6\Ar\O2
Usage: Mainly for etching III-V compound process materials.
Materials: AlGaInN\InP\As\SiO2\SiN\Cr\PR\PDMS;
Size: 4 inches and below; Temperature: 0-60℃; Masks: Cr, PR, SiO2
