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Field Emission Scanning Electron Microscope
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Product Detail

Field Emission Scanning Electron Microscope  

Model: Nova NanoSEM 450 FP2053/45  
Manufacturer: FEI Company, Czech Republic  
Main Function: Focuses a very short wavelength electron beam on the sample surface to scan and receive secondary electron signals emitted from the sample surface for imaging. It is mainly used to observe the morphology of solid surfaces and can be combined with EBSD or electron spectrometers to form an electron microprobe for material composition analysis. This electron microscope can analyze materials with low conductivity and conduct research on materials in environmental atmospheres.  
Technical Specifications: Resolution: high vacuum imaging, 0.8 nm @ 30kV (STEM) 1.0nm @ 15kV (TLD-SE) 1.4nm @ 1 kV (TLD-SE), non-decelerated mode 3.5nm@ 100 V (DBS) high vacuum analysis, analysis working distance 3.0nm @ 15 kV & 5nA (TLD-SE) low vacuum imaging, optimal working distance 1.5 nm @ 10 kV (Helix detector) 1.8 nm @ 3 kV (Helix detector)
 
Sub 1: PlutoChip Co., Ltd    -Discrete Devices and Integrated Circuits-    www.plutochip.com
Sub 2: PlutoSilica Co., Ltd   -Silicon Wafer and Glass Wafer Manufactory-
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