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Hydrofluoric Acid Vapor Etching Machine
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Product Detail

Hydrofluoric Acid Vapor Etching Machine  

Model: VPE150  
Manufacturer: Switzerland Idonus sarl  
Main Function: To enhance the safety and quality of the hydrofluoric acid etching process for silicon dioxide films  
Technical Specifications:  
1. Adhesion-free MEMS release  
2. Structural thinning: Free release of structures on SOI substrates, etching rate adjustable from 0 to about 30μm/h, single-sided SiO2 etching (protecting the backside during the process)
 
Sub 1: PlutoChip Co., Ltd    -Discrete Devices and Integrated Circuits-    www.plutochip.com
Sub 2: PlutoSilica Co., Ltd   -Silicon Wafer and Glass Wafer Manufactory-
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