Precision Photomask Manufacturing | Core Pattern Master for Micro/Nano Lithography

Process Introduction
Photomasks (or lithography masks) serve as the master template in photolithography – a foundational micro/nanofabrication process. These plates feature precisely patterned opaque chrome films on ultra-transparent substrates (quartz or soda lime glass). During exposure, the mask's design is transferred onto semiconductor wafers or product substrates with exceptional fidelity. We offer material flexibility to match your precision and budget requirements.


Technical Applications
As indispensable carriers for lithography, photomasks enable precision patterning across advanced industries:
Integrated Circuits (IC): Critical for semiconductor chip fabrication
Flat Panel Displays (FPD): Essential for LCD/OLED pixel patterning
Printed Circuit Boards (PCB): Enables high-density interconnect routing
MEMS Devices: Forms microstructures for sensors/actuators
Advanced Packaging, Optoelectronics, and other lithography-dependent fields


Process Capabilities
We deliver customized photomask solutions with:
Tailored Designs: Full-custom patterns in diverse sizes and specifications
High-Resolution Patterning: Sharp features meeting critical dimension (CD) requirements
Material Expertise: High-purity quartz substrates & cost-effective soda lime glass
Rapid Prototyping: Accelerated sampling for R&D and production timelines