Pulsed Laser Deposition (PLD) System | Neocera Pioneer 180
Capabilities:
A versatile PLD system engineered for depositing high-quality functional thin films, including complex oxides (BaTiO₃, BiFeO₃, SrAlO₃) and phase-change materials (GST). Ideal for advanced research in electronics, photonics, and energy storage applications.
Technical Specifications:
2-inch target holder and sample stage
Integrated excimer laser system
Laser scanning for improved film uniformity
RHEED in-situ monitoring for real-time growth control
Maximum heating temperature: 850°C
Process Advantages:
Precise stoichiometric transfer of target materials
Real-time monitoring and control of film growth
Excellent film uniformity through optimized laser scanning
Flexible configuration for diverse functional materials
Primary Applications:
Ferroelectric and multiferroic thin film research
Phase-change memory material development
Complex oxide semiconductor studies
Next-generation electronic and photonic devices
Why Choose Our Service？
We deliver precisely controlled functional thin films through advanced pulsed laser deposition technology. Our unique capabilities include real-time growth monitoring via RHEED and high-temperature processing up to 850°C, enabling the development of complex oxides and phase-change materials with exceptional quality. Accelerate your research in next-generation electronics and photonics with our reliable thin film solutions. Partner with us to bring your most innovative projects to fruition.
