Optical Vacuum Coating System | Leybold ARES 1100
Capabilities:
A high-precision e-beam evaporation system with ion beam assistance, engineered for depositing superior optical coatings including SiO₂, Al₂O₃, Si, and Ta₂O₅. Ideal for R&D and pilot production of optical components, semiconductor devices, and advanced thin-film applications.
Technical Specifications:
6 evaporation source crucibles for multi-layer coatings
Automatic rotating dome fixture
Electron beam evaporation with ion beam assistance
Dual thickness monitoring: quartz crystal + optical control
Within-wafer thickness uniformity: ≤ ±1%
Substrate capacity: Up to 8-inch wafers and fragments
Process Advantages:
Exceptional film uniformity enabled by rotating dome and precision control
Ion beam assistance delivers dense, stable optical films
Multi-crucible configuration enables complex coating stacks
Dual monitoring ensures accurate thickness control
Primary Applications:
Optical filter and mirror manufacturing
Semiconductor wafer-level optics
AR/VR optical components
Research and development of new optical materials
Why Choose Our Service？
Utilizing ion-assisted e-beam evaporation technology, we provide optical coating solutions with guaranteed ≤±1% uniformity for SiO₂, Al₂O₃, and Ta₂O₅ films. Our process ensures exceptional film density and thickness control, enabling faster development of advanced optical components, AR/VR devices, and semiconductor photonics. Count on our expertise to deliver reliable multi-layer coatings that meet your most demanding specifications.
