Magnetron Sputtering Tool | Lesker PVD 200
Capabilities:
A versatile sputtering system specifically designed for depositing high-performance transparent conductive oxides (TCOs) such as ITO, IZO, and IGZO. Ideal for advanced display technology, touch panel manufacturing, and flexible electronics R&D.
Technical Specifications:
100 mm sputtering target capability
Heated rotating substrate stage (up to 8-inch wafers)
Comprehensive gas system (Ar, O₂, N₂)
Dual DC and RF power supplies
±5% film thickness uniformity
Process Advantages:
Precise composition control for oxide films
Excellent film uniformity through rotating stage
Flexible reactive sputtering capability
Reliable operation with industrial-grade components
Primary Applications:
Transparent electrode fabrication
Display and touch panel manufacturing
Flexible and printed electronics
Thin-film transistor development
Why Choose Our Sputtering Service?
We deliver high-performance ITO, IZO, and IGZO films with guaranteed ±5% uniformity for superior conductivity and transparency. Our specialized sputtering process ensures precise composition control and excellent film quality, enabling faster development cycles and higher yield for your display, touch panel, and flexible electronics projects. Partner with us to advance your transparent electrode and thin-film transistor applications with reliability and expertise.
