Field Emission Scanning Electron Microscope | ZEISS GEMINI 300 System
Capabilities:
Our advanced field emission scanning electron microscope (FE-SEM) enables high-resolution observation of micro- and nanostructures, with integrated capabilities for chemical composition analysis and surface damage characterization.
Technical Specifications:
Imaging Detectors: 4 types of imaging detectors
Analytical Instrumentation: X-ray energy dispersive spectrometer (EDS), ion sputtering coater
Electron Beam Resolution: 0.7 nm at 15 kV
Image Resolution: 32K × 24K pixels
Maximum Magnification: ≥ 1,500,000× (1500kX)
Process Advantages:
Multiple imaging detectors enable comprehensive signal collection
Integrated EDS allows simultaneous imaging and compositional analysis
Ion sputtering coater supports in-situ sample preparation
Ultra-high resolution reveals finest structural details
Exceptional image resolution captures large-area, high-fidelity micrographs
Extreme magnification range accesses sub-nanometer features
Primary Applications:
High-resolution observation of micro- and nanostructure morphology, chemical composition analysis, and surface damage characterization in materials science, semiconductor failure analysis, and advanced manufacturing research.
Why Choose Our Service?
Partner with us for high-resolution SEM imaging and microanalysis solutions that deliver the structural and compositional insights your advanced materials and devices demand. Using the ZEISS GEMINI 300 system, we provide ultra-high resolution imaging, precise chemical analysis, and detailed surface characterization—supporting your R&D, failure analysis, and quality control initiatives with reliable microscopy solutions tailored to your specific investigation requirements.
