Focused Ion Beam DualBeam System | Thermo Fisher Helios 5 CX System
Capabilities:
Our advanced focused ion beam DualBeam system enables high-quality site-specific TEM sample preparation, circuit editing, and three-dimensional morphological analysis of chemical and crystal structures, as well as failure analysis.
Technical Specifications:
Deposition Capability: 5 types of precursor gases for material deposition
Analytical Instrumentation: X-ray energy dispersive spectrometer (EDS)
Ion Source: Gallium (Ga) ion source
Ion Beam Resolution: 2.5 nm at 30 kV
Ion Beam Current: 0.5 pA – 100 nA
Electron Beam Resolution: 0.6 nm at 15 kV
Electron Beam Landing Voltage: 20 eV – 30 keV
Process Advantages:
Multiple precursor gases enable versatile material deposition
Integrated EDS provides real-time compositional analysis
High-resolution ion beam delivers precise milling and sectioning
Broad ion beam current range accommodates coarse milling to fine polishing
Ultra-high electron beam resolution enables simultaneous high-quality imaging
Wide electron beam landing voltage range supports diverse sample types and applications
Primary Applications:
High-quality site-specific TEM sample preparation, circuit editing, three-dimensional morphological analysis of chemical and crystal structures, and failure analysis in semiconductor device characterization, materials science, and advanced packaging research.
Why Choose Our Service？
Partner with us for DualBeam solutions that deliver the precision, versatility, and analytical capability your most challenging sample preparation and failure analysis applications demand. Using the Thermo Fisher Helios 5 CX system, we provide high-resolution ion milling, simultaneous high-quality electron imaging, and integrated compositional analysis—supporting your TEM sample preparation, circuit modification, and 3D structural characterization initiatives with reliable DualBeam solutions tailored to your specific analytical requirements.
